Preparation and Characterization of Nickel and Aluminum-Codoped SnO2 Thin Films for Optoelectronic Applications

In this study, the coating technique was used to prepare thin layers of nickel and aluminum-codoped tin oxide (SnO2: Ni; Al). This study is aimed at exploring influence aluminum (Al) dopant on structural, optical, electrical properties elaborated films. X-ray diffraction (XRD) studies discovered that all deposited films (Ni-doped Al-Ni-codoped SnO2) were polycrystalline with tetragonal (quadratic) structure exhibited [110] preferential orientation. The optical measurements exposed prepared have presented good transparency. transmittance Ni-Al-codoped SnO2 in visible near-infrared regions varied between 80% 90%; dependent concentration dopant. band gap determined via equation related absorption coefficient. It deduced values gradually decreased from 4.084 eV 3.991 eV, as an effect Al content. addition, it concluded thickness pass 571.374 nm 694.036 Moreover, extinction coefficient decreases wavelength UV region then varies slightly towards longer wavelengths. resistivity using four-point probe; 1.35 × 10 3 ? · cm id="M2"> 0.14 increasing 0 at. % 7 %. codoped Ni present highly transparent; therefore, these look promising use window layer PV solar cells.